Used AMAT / APPLIED MATERIALS Centura WCVD #9358216 for sale

AMAT / APPLIED MATERIALS Centura WCVD
ID: 9358216
Systems (4) Chambers Type: Microwave.
AMAT / APPLIED MATERIALS Centura WCVD is a chemical vapor deposition (CVD) reactor designed for the advanced production of large-area semiconductor wafers. The reactor uses a combination of gases such as hydrogen, silane, or methane to synthesize a thin film layer on the top of a silicon substrate. These layers, usually silicon dioxide or silicon nitride, can be used in many of the layers required for modern integrated circuits. The equipment features an open-frame design with a unique gas-delivery and pre-conditioning system allowing for high-temperature processing and high-speed operation. This feature allows for a greater uniformity in the deposition of the layers, which is essential in order to create the complex circuit layouts needed in modern integrated circuits. The unit also includes a central temperature control module, controlling both the temperature of the process chamber and the incoming gas mixture. AMAT Centura WCVD reactor also features a number of safety features. For example, the reactor is built with high temperature protection to ensure that safe processing temperatures are maintained. The reactor is also equipped with a vacuum pump machine and has an overpressure protection tool that prevents the reactor from operating at too high a pressure. The asset can be used to process a variety of materials for a variety of applications. Porous, dense, and transparent films can all be synthesized using the Centura reactor. These films can be used in applications such as photovoltaic cells, catalysts, and interlayer insulation for silicon devices. The model can also be used to synthesize coatings for chemicals and other substances, reducing the need for expensive substrate treatments. APPLIED MATERIALS CENTURA WCVD reactor is an efficient and reliable piece of technology designed to produce a variety of semiconductor devices. With its high temperature performance and tight control over the deposition parameters, the equipment is an excellent choice for the production of electronic components.
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