Used AMAT / APPLIED MATERIALS Centura WxP #9236597 for sale

AMAT / APPLIED MATERIALS Centura WxP is an advanced semiconductor reactor equipment used for high-temperature annealing, metallization, and etching of substrates such as silicone, glass, and metals. It is ideal for medium- to large-scale production and can be configured to suit a wide range of high-performance applications. AMAT Centura WxP is designed for the highest levels of precision and accuracy, thanks to its powerful Wafer Prober system. The unit includes a responsive gas delivery machine, enabling accurate and rapid response to dynamic process parameters for the highest levels of flexibility and processing precision. The gas delivery tool is able to handle a wide range of process gases, including arsine, phosphine, fluorine, and chlorine-based gases. The asset offers a sophisticated control interface for efficient and intuitive operation, allowing engineers to set up both general process parameters and specific parameters for the exact substrate and process being used. The built-in wafer lifts make it easy to move the wafer sheet into the chamber, and the wafer mapping feature makes it simpler to refill the wafers when needed. APPLIED MATERIALS Centura WxP comes with two independent temperature zones, allowing the use of temperature gradient to control the temperature variation within the substrate. This makes it faster and easier to achieve uniform temperatures throughout the substrate to ensure uniformity in the final results. The model also includes a radial temp monitoring equipment, which provides temperature readings at different points within the substrate for precise control of the annealing or etching process. This, in conjunction with its precise and accurate gas delivery and the capability of setting exact parameters for different processes and substrates, makes it one of the most powerful semiconductor reactors available on the market. In short, Centura WxP offers a perfect balance of accuracy and flexibility for high-performance processing of silicone, glass, and metal substrates. Its powerful wafer mapping feature, sophisticated gas delivery system, and built-in radial temp monitoring unit make it a reliable and user-friendly tool for achieving uniform results in semiconductor production.