Used AMAT / APPLIED MATERIALS Centura WxZ #9198276 for sale

AMAT / APPLIED MATERIALS Centura WxZ Reactor is a high-performance deposition system designed to enable materials researchers and inovators to produce advanced coatings and ultrapure thin films. AMAT Centura WxZ reactor has a proprietary Plasma-Enhanced chemical vapor deposition (PECVD) process that allows for multiple layers of deposition in a single run. This process uses a mixture of reactive gases, plasma, and heat to deposit thin films of various metals, insulating materials, and chemical compounds on substrates. This process can also be used to deposit material on existing materials without damaging the underlying substrate. The reactor is also equipped with a high-resolution deposition mapping system that allows for precise location and deposition of thin films. The mapping system simplifies the deposition process and ensures the highest level of uniformity over the entire substrate. APPLIED MATERIALS Centura WxZ reactor is optimized for growth of epitaxial films and superlattices on various substrates including Si, Ge, and III-V compound semiconductors. It also offers excellent uniformity of film thickness, composition and morphology. In addition, the uniformity of film thickness makes it well suited for the deposition of multilayers, heterostructures, and nanostructures. The reactor is equipped with high-resolution metrology systems, including thin-film thickness characterization, surface topography characterization, spectral ellipsometry and transmission electron microscopy. The metrology systems provide detailed information about the film properties for best growth optimization and process control. Centura WxZ Reactor also offers a wide range of ancillary equipment, such as auto-cassette loading systems, auto-fluidic systems, in-situ cleaning systems, and thermal control systems. This ancillary equipment allows for efficient operation and optimized processing of wafers. AMAT / APPLIED MATERIALS Centura WxZ Reactor is reliable and easy to use, allowing researchers and innovators to quickly obtain the desired thin films with high deposition rates and excellent uniformity. By utilizing the latest technologies, the reactor offers superior films with superior properties and efficiency.