Used AMAT / APPLIED MATERIALS Centura WxZ #9203350 for sale

ID: 9203350
CVD System.
AMAT / APPLIED MATERIALS Centura WxZ is a process reactor designed for deposition in semiconductor manufacturing. The reactor is capable of performing both physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes. It features dual large-volume reaction volumes for greater processing throughput and flexibility. The system is equipped with an RF generator and RF plasma source, enabling uniform, high-quality films with low particulate levels. The WxZ reactor also features a vacuum chuck for substrate rotation, as well as an automated gas feed system with high-end mass flow controllers and automated in-situ monitoring of process parameters. The high-precision temperature and pressure control systems ensure consistent, repeatable results. Additionally, the WxZ reactor is designed to provide superior temperature uniformity, minimizing variability across the substrate surface. This ensures high-quality film growth over large substrates. The WxZ reactor is engineered to deliver the highest degree of process control and accuracy. The sophisticated process monitoring capabilities are able to detect film thickness and other critical process parameters in real time. It is designed to maximize throughput, as well as minimize consumable usage. The system also offers tool-access monitoring and ultraviolet (UV) light safety key printing to enhance safety. The WxZ reactor is compatible with a range of process chemistries, allowing for maximum flexibility in semiconductor manufacturing. This includes processes such as ion beam etch (IBE), reactive ion etch (RIE), atomic layer deposition (ALD), and electrochemical applications. The reactor is constructed from robust, high-quality materials, ensuring reliable operation and extended product life. Additionally, its sealed-chamber design allows for easy maintenance, as well as helping to prevent contamination and ensure process repeatability. AMAT Centura WxZ is a reliable tool for achieving high-quality films, with superior process control and greater efficiency.
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