Used AMAT / APPLIED MATERIALS Centura WxZ #9315574 for sale

AMAT / APPLIED MATERIALS Centura WxZ reactor is a highly efficient, high-performance plasma etch equipment designed for critical applications in the semiconductor industry. The reactor is capable of simultaneous processing of both n-type and p-type wafers, enabling the highest levels of device yields and throughput. AMAT Centura WxZ is a dual-zone reactor that integrates classical and advanced plasma etch technologies to precisely control the precise timing and dose of a wide range of etch etchants. The system is equipped with an enclosed RF chamber, allowing precise control over the plasma environment and ensuring that the wafers are exposed to uniform and consistent etching conditions. APPLIED MATERIALS Centura WxZ also features a variable gas injection unit, allowing precise control over the etchant gas flow rates. This allows for precise control over etch rate, selectivity and ion energy, as well as optimizing the uniformity and repeatability of etch processes. The machine can be configured to work with a wide range of gases, including Ar, CF4, HCl, O2 and SF6, to ensure optimal process performance. Centura WxZ also features a sophisticated vacuum tool that minimizes contamination and improves etch chamber repeatability. The vacuum asset is designed to minimize particle contamination and minimize the risk of wafer damage. The model also features a novel electrostatic chuck design, which ensures a strong but uniform clamping of the wafer, allowing precise control of etch uniformity and yield. Finally, AMAT / APPLIED MATERIALS Centura WxZ includes a wide variety of enhanced automation and process control features, providing a comprehensive platform for now-end optimization of plasma etch processes. The platform includes a user-friendly graphical user interface, real-time process monitoring and diagnostic features, as well as a comprehensive library of pre-defined etch processes. Overall, AMAT Centura WxZ is a versatile and highly efficient plasma etch reactor, capable of producing superior results for critical etch processes in the semiconductor industry. By combining classical and advanced plasma etch technologies, the equipment is capable of achieving identical etch characteristics, ensuring the highest levels of device yields and throughput. With its comprehensive set of automation and process control features, APPLIED MATERIALS Centura WxZ is an ideal choice for those seeking superior etch results.