Used AMAT / APPLIED MATERIALS Centura XZ #9093325 for sale

AMAT / APPLIED MATERIALS Centura XZ reactor is a PECVD equipment designed for high-productivity fabrication of advanced semiconductor and optoelectronic devices. The system features highly integrated operation controls as well as automatic loading and unloading capability. The unit can be configured to provide up to three independent process chambers, each supported by a dedicated high-frequency power supply. Each chamber is equipped with potentiostat technology, allowing precise control of plasma parameters for effective etch rate/selectivity control. AMAT Centura XZ reactor offers a flexible platform for production of CMOS devices, MEMS structures, MEMS components, and monocrystalline silicon semiconductor devices. The machine is capable of Ultra-High Deposition (UHD) processes and is equipped with a High-Voltage RF Generator (HV-RF) for improved surface uniformity during PECVD processes. The tool's programmed deposition control asset (DCS) provides precision control and repeatability of film thickness throughout the entire wafer. APPLIED MATERIALS Centura XZ reactor features an array of innovative tools to enhance process control and performance. This includes an automated dopant delivery model for in-situ doping, which can minimize material loss and ensure repeatable doping concentrations. The equipment also supports precise etch control through the utilization of various reactive gas mixtures in either a single chamber or multiple chamber configuration. In addition, the system offers uniform deposition rates over a wide range of deposition temperatures, maximizing product quality. The reactor is designed for rapid tool startup and ease of operation, allowing for faster wafer production. The unit is modular and highly automated, reducing the complexity of loading and unloading wafers and providing a safe environment for personnel. The machine also features built-in safety features such as interlocks to prevent high pressure and contamination incidents. Centura XZ reactor is an innovative tool that provides a range of solutions for advanced process demands. It is designed to be versatile and can be configured to meet the specific requirements of a wide variety of applications. The asset provides precise process control, high uniformity deposition rates, and the ability to integrate in-situ doping for seamless doping concentration control. Through the combination of performance, reliability, and low maintenance, AMAT / APPLIED MATERIALS Centura XZ reactor is an ideal choice for high-productivity fabrication of advanced semiconductor and optoelectronic devices.