Used AMAT / APPLIED MATERIALS CENTURA #110367 for sale

AMAT / APPLIED MATERIALS CENTURA Reactor is a type of tool used in the fabrication of semiconductors, providing plasma-based processing and etching capabilities for use in the manufacture of high-performance and cutting-edge semiconductor components. It is specifically designed for use in high-volume production operations, such as those found in advanced electronic packaging, memory chip manufacturing, and ultra-thin devices like mobile applications and displays. AMAT CENTURA Reactor combines advanced plasma etch technology with a highly versatile and integrated design, lending itself to manufacturers who require advanced process control and exacting precision. The reactor utilizes dual-action target plating and rapid-thermal processing to deliver superior performance. APPLIED MATERIALS CENTURA Reactor features a range of technical advantages, such as the ability to reach plasma capabilities in both DC and RF modes. This provides an additional level of control and flexibility to the process, allowing for fine-tuning of processes such as etching and surface treatment. Moreover, the reactor enables high-precision etch control with up to two levels of process control and unmatched accuracy in critical etching operations. This also applies to the overall processing time, allowing for shorter cycle times, improved throughput, and faster delivery of finished goods. CENTURA Reactor is protected against potential etching contamination by a two-stage gas purification system. This ensures that any process gases are properly filtered, reducing the chances of particulate or foreign matter from entering the etching chamber and introducing a potential process variance. In addition, its design also allows for the quick and easy replacement of the filters, ensuring that processes remain consistent and uninterrupted. AMAT / APPLIED MATERIALS CENTURA Reactor also features high-performance safety features and cutting-edge automation. The reactor's control loop allows for real-time control of pressure, temperature, chamber temperature, etc., ensuring consistent performance and reliable operation. As well, the integrated machine protection functionality prevents any potential process malfunctions through a sophisticated overload protection system. AMAT CENTURA Reactor has become an industry leader in providing efficient and reliable plasma etch capabilities for advanced semiconductor device fabrication. This high-performance reactor has been tailored to meet the demand of today's most advanced and intricate semiconductor device products. The reactor's unique design and technical capabilities provide superior etch performance and accuracy, enabling companies to produce higher quality products for a wide range of applications.