Used AMAT / APPLIED MATERIALS CENTURA #146827 for sale

AMAT / APPLIED MATERIALS CENTURA reactor is one of the most advanced and reliable systems for semiconductor device fabrication and plasma processing. It is a highly flexible tool for both R&D and production applications in semiconductor device fabrication. The equipment has two main components: The first is a vacuum chamber composed of a series of quartz or stainless steel plates, which can be pressurized with inert gases and through which vacuum can be stabilized. The second component is a cathode assembly, which holds the cathode material and can be inserted into the chamber to generate plasma. In addition, it has an RF generator, which supplies an electrical power for the plasma and a gas supply system for admitting process gases into the chamber. The RF Generator in AMAT CENTURA reactor is a high-voltage module that is capable of controlling the power output. This allows the operator to fine tune the operating parameters and select the best power control settings. The RF generator also handles the control of the bias voltage that is applied to the wafer. The RF generator is also connected to the base plate of the chamber, which acts as a shield and helps to prevent interference with the circuit. The gas supply unit is also a key component of APPLIED MATERIALS CENTURA reactor. It is connected to the vacuum chamber through a set of input and output valves and is used to introduce process gases such as oxygen and nitrogen into the chamber. This gas is then mixed with the process material and re-circulated in the chamber to maintain proper temperature and pressure control. The cathode assembly in CENTURA reactor is composed of a set of electrodes that are held in place by a combination of mechanical and electrical components. These electrodes are responsible for forming plasma within the chamber, and the type and combination of electrodes used varies depending on the application. The cathode assembly can be customized to suit the specific needs of the user. Finally, the chamber of AMAT / APPLIED MATERIALS CENTURA reactor is also highly adjustable and can be programmed to either increase or decrease the temperature and vacuum levels in the chamber. This allows the user to achieve the desired operating conditions, which can drastically improve the yield of the process. In summary, AMAT CENTURA reactor is a reliable and versatile machine for semiconductor device fabrication and plasma processing. It provides an excellent combination of features that support R&D and production applications and a reliable set of features like RF generator, gas supply tool, and cathode assembly. All of these components combine to make APPLIED MATERIALS CENTURA reactor one of the most popular choices for semiconductor device fabrication and plasma processing.