Used AMAT / APPLIED MATERIALS CENTURA #190797 for sale

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AMAT / APPLIED MATERIALS CENTURA
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ID: 190797
DxZ PE Silane system (3) chambers 2001 vintage.
AMAT / APPLIED MATERIALS CENTURA is an advanced thin-film deposition reactor designed for the fabrication of extremely precise, high-performance microdevices. This reactor allows engineers to create complex, multi-layer components critical for the performance of many types of electronics. AMAT CENTURA reactor features superior uniformity, precise temperature control, and advanced source material management, creating an ideal environment for precise thin-film deposition. APPLIED MATERIALS CENTURA reactor is equipped with a range of automated processes and precise hardware that provide optimal material deposits and precise control of the process parameters. The reactor consists of a reaction chamber and a vacuum chamber. The reaction chamber contains the sources of energy, such as electrons, beams, ions, and gases, that are used to deposit thin films. The vacuum chamber maintains the vacuum while the reaction occurs. The source materials are delivered to CENTURA reactor by means of a conveyor equipment, which allows engineers to easily control and monitor the processes. The reactor is equipped with a high-capacity adjustable heater, which allows precise control of the process temperatures. A powerful Vacuum Control System (VCS) maintains the vacuum and monitors the parameters in the reaction chamber. AMAT / APPLIED MATERIALS CENTURA reactor also features a sophisticated advanced deposition unit (ADS) to ensure the uniformity of the deposited films. The machine uses a specialized source material coater and substrate platter to provide accurate, uniform deposition over the surface of the substrate. This ensures that the films are of the highest quality and meet the most exacting specifications. In addition, AMAT CENTURA reactor has many advanced capabilities for monitoring and controlling the deposition process. It can record, analyze, and store data from each deposition run. It also features an in-situ pressure sensor and ionization monitor, making it easy to detect any process irregularities or contaminations. APPLIED MATERIALS CENTURA reactor is highly reliable and provides excellent results when used for thin-film deposition. Its precise temperature control, advanced source material management, and uniform deposition tool provide optimal results. Thanks to its reliable performance, it is a popular choice for design engineers who require high-precision components for their projects.
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