Used AMAT / APPLIED MATERIALS CENTURA #201071 for sale

AMAT / APPLIED MATERIALS CENTURA wafer processing equipment is an advanced film deposition reactor used in semiconductor fabrication. It is designed to maximize throughput and uniformity, while minimizing scrap rates. Utilizing advanced thin film precursor sources, AMAT CENTURA reactor offers a web-shaped chamber which allows for multiple runset configurations, increasing film thickness uniformity and further optimizing throughput. Along with its advanced chamber design, APPLIED MATERIALS CENTURA offers state-of-the-art process control, customizable to fit the fabrication requirement of any semiconductor device. CENTURA reactor is built upon a solid, durable frame for maximum vibration control, and offers a standard 4" x 4" wafer size - small enough for quick experimentation. Additionally, AMAT / APPLIED MATERIALS CENTURA reactor combines a low-pressure, low-temperature deposition environment with a highly versatile active power supply. Their proprietary, dedicated flange acts as an expanded gas delivery system, ensuring even distribution over the wafer substrate, while the active power supply offers a full range of parameters to fine-tune any given process. When it comes to productivity and repeatability, the real draw to AMAT CENTURA reactor is its ability to optimize processes that are both time-intensive and highly destructive. Utilizing proprietary precursor materials and a patented "Quench-Guard" chamber enables APPLIED MATERIALS CENTURA to deposit thin-film precursors rapidly and uniformly. With this unit, optimal uniformity can be achieved, even under demanding high-temperature annealing conditions. As with any novel deposition machine, process repeatability and uniformity is a key component of optimized thin-film deposition capabilities. With CENTURA, process repeatability is further improved, thanks to their Active Gas Versatility Tool, or AGVS. This asset holds up to three different gasses, allowing for adjustment to multiple process parameters in one single cycle. This significantly reduces the need for manual adjustments, and offers greater accuracy in the deposition process. To further enhancing the performance of AMAT / APPLIED MATERIALS CENTURA reactor, an automated shutter provides a controlled annealing environment, ensuring both deposition uniformity and process repeatability. Additionally, a robot arm is included with the model, allowing for easy loading and unloading of wafers. This ensures maximum wafer throughput and a dramatic reduction in manual labor. The equipment also offers intuitive software that is a marvel of modern as it helps users to configure the parameters for optimal thin film deposition in a few button clicks. Taking all of these features into account, it is easy to see why AMAT CENTURA reactor is a revolutionary device in the world of semiconductor fabrication. From its versatile chamber design to its advanced software controls, it is paving the way for the future of thin film deposition. With its fast, accurate, and repeatable results, APPLIED MATERIALS CENTURA is giving semiconductor manufacturers the tools they need to produce robust and reliable devices.