Used AMAT / APPLIED MATERIALS CENTURA #293592513 for sale

AMAT / APPLIED MATERIALS CENTURA
ID: 293592513
Wafer Size: 6"
Metal etcher, 6".
AMAT / APPLIED MATERIALS CENTURA is a leading edge, ion implantation reactor used to process and modify the material properties of silicon and semiconductor materials. The primary purpose of this reactor is to inject ions of certain substances into a semiconductor substrate in order to create one or more desired effects. The interior of the reactor consists of several key components, starting with the ion source. This contains the ions that will be injected into the substrate and is made up of a gas supply system, an electron beam accelerator, and a high-voltage field system. From here, the ions are directed to the substrates via the mass-separation optics. This optics also works to separate and limit the number of ions that are delivered to the substrate. Once the ions have reached the substrate, they are then further processed. This process is accomplished with the help of a diffusion module, a beamline scanner, and the main RF electrode. The beamline scanner is responsible for controlling the number and type of ions delivered to the substrate. The main RF electrode is the central component of the reactor and uses radio-frequency fields to accelerate and direct the ions. Finally, the diffusion module is responsible for controlling the local temperature of the substrate and for allowing additional impurities to be added to the substrate. Once the ions have been implanted into the substrate, AMAT CENTURA reactor can then dig into deeper processing. This can include ion etching and ion milling, which are responsible for further manipulating the properties of the substrate. Moreover, additional clean-up steps can be performed on the substrate to ensure a high-quality product. Overall, APPLIED MATERIALS CENTURA is a powerful tool for controlling, manipulating, and modifying the properties of semiconductor materials. It is used as an important piece of equipment in many industries and can be used to create extended and improved semiconductor products.
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