Used AMAT / APPLIED MATERIALS CENTURA #293598413 for sale

AMAT / APPLIED MATERIALS Centura Enabler is a state-of-the-art CVD/PECVD reactor equipment designed for the deposition of thin films on a variety of substrates. This advanced system is equipped with two chambers, and each chamber is equipped with a single process gas line and a pair of positionally coupled susceptor/electrode assemblies, allowing for process flexibility and superior film uniformity. AMAT Centura Enabler utilizes advanced technology to provide superior uniformity, reproducibility, and precision. This unit features a dual zone process chamber that can accommodate up to two substrates. The process pressure ranges from atmospheric-controlled up to 760 torrs. This machine also features a range of efficient process gases, from Ar, O2, N2, H2, CH4 and more. This accomplished tool is built to maximize process efficiency, minimize thermal loss, and provide increased production uptime. To accomplish this, it is equipped with a high power pyrometer asset, closed-loop temperature controller, and enhanced gas dynamic distribution systems for precision thermal segmentation. Additionally, this model is pre-equipped with ATC-on-the-Fly (ATCOTF) technology, which provides optimal dynamic process control without sacrificing throughput. In terms of process dynamics, APPLIED MATERIALS Centura Enabler utilizes an enhanced (HTE) high-temperature electron beam reaction chamber capable of operation up to 1300°C. Its superior surface heating and uniformity are further improved by the harmonic resonance of its two susceptors and two electrodes. The equipment also features an advanced Active Gas Management (AGM) interface for advanced gas delivery and utilization in both chambers. Additionally, Centura Enabler also keeps excellent temperature control throughout the entire film deposition process. Post-process metrology can be incorporated by equipping the system with a scanning electron microscope (SEM). In summary, AMAT / APPLIED MATERIALS Centura Enabler provides numerous advanced features and capabilities that enable the deposition of thin films of exceptional uniformity and reproducibility. This CVD/PECVD unit is ideal for applications requiring high precision and process control.