Used AMAT / APPLIED MATERIALS CENTURA #293607516 for sale

ID: 293607516
Wafer Size: 8"
Vintage: 2003
Etcher, 8" 2003 vintage.
AMAT / APPLIED MATERIALS CENTURA is a high-performance semiconductor wafer processing equipment designed by AMAT. It is an integrated comprehensive solution that enables manufacturers to increase productivity and maximize yields. AMAT CENTURA system combines multiple process steps in one platform, allowing for repeatable and controllable processing of a wide range of materials and substrates. The advanced unit allows for integrated metrology and inspection capabilities and process repeatability. The machine is also equipped with various features that can be used to measure performance parameters such as temperature, pressure, flow, voltage and current. APPLIED MATERIALS CENTURA is compatible with all photolithography systems. The wafer processing reaction chamber includes an Etchant, Route, Electrochemical Deposition (ECD), Diffusion, and RTP (Rapid Thermal Processing). The chamber is designed to allow for quick, reliable and repeatable results for any wafer size and shape. The other main component of the tool is the Wafer Mapping Station which is allows for flexible placement and alignment of the wafers according to their application. This allows for accurate mapping of device characteristics and monitoring of any changes that occur during the optical and electrical testing. The Etch and Diffusion capabilities of CENTURA allow for efficient removal of unwanted layer materials, allowing for uniformity of process. The electrochemical deposition (ECD) capabilities enable the formation of uniform patterning in metal and metal oxides. The rapid thermal processing (RTP) chamber allows for rapid annealing of the substrate. The ECD chamber also features a higher rate of metal deposition, reducing process time and increasing yield. AMAT / APPLIED MATERIALS CENTURA is a one-of-a-kind, integrated wafer processing solution. The asset minimizes the overall risk during production run and has the capability to deliver reliable results while ensuring pixel uniformity. This reactor is highly versatile and efficient, making it suitable for a wide range of applications in semiconductor manufacturing.
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