Used AMAT / APPLIED MATERIALS CENTURA #293614967 for sale

AMAT / APPLIED MATERIALS CENTURA is a plasma-enhanced chemical vapor deposition (PECVD) reactor. This type of reactor is used to deposit thin layers of material onto various substrates, such as semiconductors and other electronic components, in the fabrication of integrated circuits, photovoltaic cells, and other devices. AMAT CENTURA is designed to be a productive, flexible, and high-performance reactor that provides superior material deposition capabilities. It utilizes a robust remote plasma source (RPS) to generate highly reactive and clean plasmas with the ability to switch up multiple chemistries and process parameters. APPLIED MATERIALS CENTURA has a vacuum vessel designed with an innovative, easy-to-use inductively coupled plasma (ICP) source. It offers customizable, highly uniform plasma parameters across the substrate for uniform deposition. An optimized design of the RF connections, RF tuning circuitry and antenna scaling all provide excellent plasma tuning by reducing the spectral noise and maintaining a uniform plasma across the susceptor. By enabling precise power and current control, the ICP source efficiently removes substrate charging and eliminates sputtering. The main feature of CENTURA is its ability to create materials with a wide range of dopant concentrations and chemical precursors, offering greater flexibility for materials engineering and device fabrication. The PECVD system is capable of producing a range of materials, such as single-crystal SiGe alloys, rare-earth oxides, and ultra-thin silica layers, with precise and repeatable doping capabilities. AMAT / APPLIED MATERIALS CENTURA is also equipped with both rapid-thermal diffusion separators and rapid-thermal epitaxy reactors, enabling dopant exchange and defect reduction for device processing. When it comes to loading and temperature control, AMAT CENTURA offers a unique set of features. Its integrated loadlock cassette is capable of high-temperature operations, capable of maintaining high uniformity for up to five substrates. With the low-profile design, the system is simple and easy to use, with an automated substrate transfer system that allows for quick loading and processing of substrates. APPLIED MATERIALS CENTURA is an advanced PECVD reactor that combines reliable performance with a wide range of deposition capabilities. Its innovative features offer unparalleled flexibility and performance, while its optimized design reduces maintenance costs, saving time and boosting throughput. As a result, CENTURA is the perfect choice for advanced device fabrication when speed and high-quality deposition processes are desired.