Used AMAT / APPLIED MATERIALS CENTURA #293619653 for sale
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ID: 293619653
Wafer Size: 12"
Vintage: 2004
Etcher, 12"
EFEM
MP 40B-GL ADVANCED THERMAL Chiller
(3) Workstations
(3) Chambers (A, B, C)
AC Rack
Front panel
Pump
Pallet
Cable
2004 vintage.
AMAT / APPLIED MATERIALS Centura Enabler is a high-performance, multi-purpose plasma reaction system designed to support the continual innovation and production of advanced materials. This reactor enables the processing of dielectric, metal, polymer, and organic layers, as well as multilayer assemblies and coatings in a single operation. It offers a range of high-temperature, high-performance plasma cleaning, treatment, and deposition of diverse materials. AMAT Centura Enabler offers increased throughput and reliability, as well as improved process uniformity and process control. It features an integrated plasma source, demonstrated vacuum systems, and a power efficiency that provides greater overall processing efficiency. Additionally, the Enabler has an open frame design to facilitate easy loading and retrieval of the workpiece and potential for easy automation. With a maximum processing temperature of up to 1000°C, APPLIED MATERIALS Centura Enabler permits processes like touch-less PECVD, Volatilmetal CVD, and thermal evaporation, as well as deposition and etching of polymers and dielectric films. The reactor also enables the combination of different deposition processes on the same substrate to produce multi-layer structures. Moreover, it supports processes with Variable Composition Modulation (VCM), whereby the composition of the deposited material is changed during the deposition run. Centura Enabler enables uniform deposition within a wide range of temperatures and at high rates, making it perfect for precision coating applications including hard coatings, sealing, encapsulation, and diffusion. Additionally, it can be used in vacuum furnace systems, such as AMAT Multi-Chamber System, to enable both wet and dry processes, as well as to streamline complex process sequences. AMAT / APPLIED MATERIALS Centura Enabler is equipped with dual hot/cold-wall RF plasmas, allowing users to optimize the deposition quality, uniformity, and rates across different temperature ranges. Its advanced sensors, temperature controllers, sophisticated power supplies, and intelligent process control systems enable improved process control and operational accuracy. Additionally, safety and maintenance monitoring helps ensure a reliable and efficient work environment, and an end-user-friendly user interface allows the user to quickly and easily adjust recipes and parameters. In conclusion, AMAT Centura Enabler is a robust and reliable reactor designed to enable high-temperature, high-performance and multi-purpose plasma processes for a wide range of coatings and material layers. APPLIED MATERIALS Centura Enabler delivers increased throughput and reliability, as well as improved process control and uniformity. As such, it is a useful tool for laboratories and manufacturing environments seeking to develop advanced coatings and materials.
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