Used AMAT / APPLIED MATERIALS CENTURA #293628309 for sale

AMAT / APPLIED MATERIALS CENTURA is a deposition tool that is designed for the growth of epitaxial films on large area substrates. The chamber is designed such that ions can be implanted into the films from all directions, ensuring the uniformity of film deposition. This type of deposition is known as Epitaxy and is commonly used for creating ultra-thin and multi-layer structures in semiconductor devices. AMAT CENTURA reactor can be operated in Vacuum or Pressure, and is optimized for a uniform thermal cycle during films deposition. It is equipped with a unique "Multi-Ion Source" that enables the co-deposition of diverse films onto substrate. This multi-ion source utilizes proprietary recipes that are specifically designed for each application. APPLIED MATERIALS CENTURA features a high-temperature, low-pressure environment that operates in a cleanroom-like atmosphere. Its low-viscosity, high-pressure, inert atmosphere enables the deposition of thermal-stable materials with exceptional uniformity. The inert environment ensures that contaminants are not introduced during the film deposition process, resulting in crisp and reliable features without any grainy artifacts. An Ultra-High Vacuum (UHV) is an important component of CENTURA reactor. The UHV allows the chamber to operate at very low pressures, permitting the co-deposition of multiple films and improving the uniformity of the films grown on the substrate. Additionally, UHV ensures an ultra-clean growth environment, protecting the integrity of the device being constructed. AMAT / APPLIED MATERIALS CENTURA is powered by a modern power supply that is designed to provide extremely low temperatures for enhanced processes. The power supply provides a high degree of temperature precision, ensuring precisely engineered features and excellent uniformity across the substrate plane. AMAT CENTURA can be configured with additional hardware such as a Load-Lock (LLS) for wafer exchange cycles. The Load-Lock system enables quick wafer exchange cycles between the deposition chamber and the load-lock chamber. This system significantly reduces the chances of contamination and oxidation of the wafers being processed and helps improve the reproducibility of results. The latest version of APPLIED MATERIALS CENTURA is tailored to meet a wide variety of customer needs. The newly released "Intuitive CENTURA Instrumentation" is designed to reduce the learning curve and help users get up-to-speed quickly. In addition, it features a "Smart Controller" for automated control of the deposition parameters that can be set for optimized performance. AMAT / APPLIED MATERIALS CENTURA system is a powerful deposition tool for the fabrication of functional, high-performance semiconductor devices. It utilizes precise deposition systems, inert environment, and accurate temperature control for uniformity and reproducibility. With its continuing evolution, it is certain to remain an important tool for the modern semiconductor industry.