Used AMAT / APPLIED MATERIALS CENTURA #293649931 for sale

ID: 293649931
Wafer Size: 12"
Etcher, 12" OEM Process Transfer chamber (3) Chambers (2) AC Racks Loader Missing parts.
AMAT / APPLIED MATERIALS Centura Enabler is a magnetic-field-assisted plasma-based physical vapor deposition (PVD) reactor designed for the deposition of thin films. The Enabler is designed with a cold-wall RF magnetron process that eliminates the need for a thermal heat source, and enabling it to produce high-quality, defect-free thin films at lower processing temperatures. It is capable of a wide range of deposition rates and can process from a few angstroms up to several micrometers per deposition cycle. AMAT Centura Enabler features a high-performance, low-power RF generator and a compact, adjustable RF antenna platen. The combination of a high-frequency RF generator and an adjustable RF antenna platen allows for precise control of the physical vapor deposition process and provides an efficient use of the available plasma power. The generator can produce a range of power levels, as low as a few watts to as much as several hundred watts, allowing for precise control of the deposition process. Additionally, the adjustable RF antenna platen enables the user to adjust the placement and orientation of the RF antenna based on the specific materials being deposited. APPLIED MATERIALS Centura Enabler is also equipped with a sophisticated monitoring, control and safety system, allowing the user to adjust the process parameters in real-time, optimizing for uniformity and repeatability. The monitoring system also logs a variety of process conditions, allowing for detailed analysis and verification of deposition performance, aiding in troubleshooting and maintenance activities. Centura Enabler's advanced design and optics allow for a wide range of deposition techniques, including chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD) and atomic layer deposition (ALD). These techniques allow for the deposition of some of the most technologically demanding materials, including metal oxides, nanostructured carbon, and high surface-energy materials. The Enabler can also be equipped with a gas delivery system, allowing the user to mix and deposit different materials in a single process. AMAT / APPLIED MATERIALS Centura Enabler is an incredibly versatile tool, offering a wide range of features and capabilities, enabling it to process some of the most advanced materials in a reliable and repeatable manner. By utilizing modern plasma deposition technology, the Enabler can assist in creating some of the most complex materials used in today's technology.
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