Used AMAT / APPLIED MATERIALS CENTURA #293767050 for sale

AMAT / APPLIED MATERIALS CENTURA is a series of single-wafer chemical vapor deposition (CVD) reactors designed specifically for semiconductor device fabrication. The CVD systems offer a versatile platform that can be configured to perform a variety of processes, including deposition, etching, and pulsed plasma deposition. The enhanced design of AMAT CENTURA provides the highest throughput and lowest operational costs in its class. APPLIED MATERIALS CENTURA series of CVD reactors have been designed to improve upon the basic design of a single-wafer CVD equipment. The system platform offers a robust and proven design and is suitable for a wide range of process applications. CENTURA is made up of several components, including a heated single-wafer susceptor, an injector for the reactive gasses, and a vacuum chamber. The susceptor is the part of the CVD unit that supports and heats the wafer during deposition. AMAT / APPLIED MATERIALS CENTURA utilizes a uniquely engineered susceptor, equipped with distributed heating elements, to evenly heat the substrate. This susceptor can achieve temperatures of up to 1000°C, allowing for higher deposition rates and more uniform film quality. The gas delivery machine is the mechanism used to deliver reactive gas to the process chamber. AMAT CENTURA utilizes an innovative gas injector - referred to as the A-Plume - which consists of an array of concentric hollow tubes running along the length of the process chamber. Reactive gasses are injected through these tubes and into the processing chamber via a series of carefully designed baffles. The A-Plume tool provides improved uniformity of the process flow and higher deposition rates. The process chamber is the enclosure where the deposition process occurs. APPLIED MATERIALS CENTURA utilizes a dual-hinged, lift-off lid that provides access to the susceptor when needed. The chamber is designed with a triple-stage pumping asset that utilizes both a scroll and a turbomolecular pump. This enables a high degree of vacuum in a relatively short amount of time. CENTURA series of CVD reactors is a powerful tool for semiconductor device fabrication. The unique features of the platform provide reliable and repeatable process control and superior performance. AMAT / APPLIED MATERIALS CENTURA is capable of achieving precise controllability over both the spatial and temperature deposition properties of the CVD process. This results in both high yield rate and low defect density with any film type.