Used AMAT / APPLIED MATERIALS CENTURA #9026986 for sale

AMAT / APPLIED MATERIALS CENTURA is a high throughput chemical vapor deposition (CVD) reactor from AMAT. It is a full-featured process tool used for deposition of low dielectric layer materials, such as SiO2, SiN, and SiOCH. The capability of the CVD process is not limited to SiO2 deposition, but it can also be used for deposition of a variety of other materials, such as poly Si, poly SiGe, TaN and others. AMAT CENTURA reactor features a large, low-vacuum chamber with a diameter of up to 20 inches. Its two heat zones can be adjusted independently, allowing for uniform deposition across the entire substrate. In order to maximize process throughput and minimize product cycle time, the equipment is designed with a high-volume gas distributor for rapid gas mixing and delivery. The reactor is equipped with a hot wall injector and with a cold wall low pressure CVD source for precise solid-source CVD. The system includes a linear-array showerhead with up to 40 RF facing ports that evenly distribute the reactant gases to the wafer/substrate surface. The unit also offers a variety of wafer/substrate transport options and also contains internal scrubbing and cleaning systems, allowing for repeatable processing with excellent repeatability and uniformity. APPLIED MATERIALS CENTURA is also outfitted with a robust, digital control machine. This allows for precise, consistent control of the reactor's temperature, pressure, and flow rate of the reactant gases. CENTURA's in-situ monitoring offers accurate in-situ characterization, which is critical for ensuring repeatability of the resulting layer thickness, uniformity, and quality. APPLIED MATERIALS offers a variety of accessories and features to further enhance the reactor's performance, such as a cassette-to-cassette end effector (C2C AE) which allows for quick, automated loading and unloading of substrates, as well as a loader, unloader, and pump transition module (LUT). AMAT / APPLIED MATERIALS CENTURA represents a reliable and robust CVD process tool for deposition of a wide range of low dielectric layer materials. Its wide range of process capabilities and modular accessories offer users advanced control of the coating process, and can be integrated into existing modules and architectures without the need for major infrastructure changes.