Used AMAT / APPLIED MATERIALS CENTURA #9065058 for sale

AMAT / APPLIED MATERIALS CENTURA reactor is a highly efficient tool for semiconductor device fabrication. It is designed for the high-volume mass-production of chips, circuits, and other microelectronic components. It offers a wide range of capabilities for deposition, etching and ion implantation applications. AMAT CENTURA reactor is an advanced, large-scale electronic equipment that can be used for single-wafer or batch processing. It features a powerful, high-temperature, high-pressure, and high-vacuum process chamber that can achieve exceptional process accuracy and uniformity. The system is highly reliable, offering high-accuracy temperature control of +/-1°C, leading to low defect rates. The reactor is also highly automated, and can be programmed for specific deposition, etching and ion implantation processes. APPLIED MATERIALS CENTURA reactor consists of several components. The main chamber is equipped with an RF (radio frequency) plasma source and a thermal source, both of which are used for the reactive ion etching (RIE) process. The RF source enables laser ablation and etching of circuits with high precision. The thermal source maintains a constant temperature level within the chamber during the etching process. The reactor also features load locks and cryopumps, which maintain a high-vacuum level throughout the process. CENTURA reactor also features a gas delivery unit that allows for precise delivery of gases and liquids into the reaction chamber. This machine can be controlled and monitored with a user interface. AMAT / APPLIED MATERIALS CENTURA reactor also includes a vacuum manifold, relay boar, and pressure toplock which enables seamless processing of multiple substrates simultaneously. AMAT CENTURA reactor is equipped with state-of-the-art safety features to ensure that operator safety and product reliability are maintained. The reactor is equipped with both electrical and physical security systems as well as an emergency stop button for quick and safe shut down. Overall, APPLIED MATERIALS CENTURA Reactor has been designed to enable efficient and precise semiconductor device fabrication. It offers various advanced features and technology which enable reliable, high-precision and repeatable processes for deposition, etching and ion implantation applications. The reactor is suitable for both single-wafer and batch processing, and is equipped with sophisticated safety features which ensure maximum safety and reliability during operation.