Used AMAT / APPLIED MATERIALS CENTURA #9072602 for sale

AMAT / APPLIED MATERIALS CENTURA is a specialized chemical vapor deposition (CVD) reactor that provides thin-film deposition of crystalline silicon for the semiconductor, photovoltaic and display markets. AMAT CENTURA is designed to deposition thin, conformal layers of silicon at a high temperature, producing a crystalline silicon layer with excellent uniformity. This semiconductor fabrication process is used to produce features such as gates, interconnects, transistors, and other circuit devices on silicon wafers. APPLIED MATERIALS CENTURA reactor is capable of reaching very high temperatures between 350 - 1,000°C with high-vacuum levels for deposition of devices with high uniformity and reliability. CENTURA is a type of low-pressure CVD (LPCVD) tool, which is a common method for deposition of silicon. This LPCVD reactor operates by delivering silicon-containing precursors (such as silane, dichlorosilane, or trichlorosilane) and other reactants into a heated chamber. Within the reactor, the reactants break down and recombine, using thermal energy to form a silicon dioxide or silicon nitride film layer. The temperatures and pressures achieved within the reactor enable the formation of high-quality, crystallized silicon films with ultra-thin thicknesses of less than 10 nanometers. AMAT / APPLIED MATERIALS CENTURA is able to achieve local uniformities of within 0.3 microns on 200 mm wafer substrates and excellent uniformity across the substrate. This high degree of uniformity helps to produce wires and other features with high device yields. Additionally, AMAT CENTURA has a very high throughput which enables quick deposition of large amounts of layers to be applied for solar cells, transistors and other semiconductor components. Another key feature of APPLIED MATERIALS CENTURA is its ultra-low particles and particles. The reactor measures particles down to a size of 0.3 microns, significantly reducing the amount of particles in the deposition process and enabling high yields of reliable devices with minimal defects. The low particle rate of CENTURA also helps to ensure product lifecycle longevity. AMAT / APPLIED MATERIALS CENTURA provides an efficient, uniform, and highly reliable fabrication process for providing both single layer and multiple layer deposition. This industry-leading CVD tool has enabled manufacturers in the semiconductor industry to achieve the high precision and repeatable performance required for today's shrinking geometries and device sizes.