Used AMAT / APPLIED MATERIALS CENTURA #9082524 for sale

AMAT / APPLIED MATERIALS CENTURA reactor is a highly efficient and precise physical vapor deposition (PVD) tool designed to provide reliable and repeatable thin film deposition processes. It is one of the most advanced systems of its kind and is typically used in the semiconductor industry for the deposition of materials such as titanium nitride, gallium arsenide, and aluminum for device fabrication. This equipment consists of four major components: a plasma source, a susceptor, a wafer-handling system, and a controller. The plasma source of AMAT CENTURA is a 300mm Spectra source which enables the deposition of dielectric and metal thin films. It is capable of producing a low voltage, high-frequency electric field which is then ionized to form a dense plasma cloud of reactant gases that is used to sputter target material and create thin films. This unit is also compatible with a variety of gases, including nitrogen and oxygen, which can be used to control the thin film properties. The susceptor of the machine is an advanced element used to support and heat the wafer during deposition. It is composed of a molybdenum-coated graphite plate, which is equipped with a unique set of heaters and controls to ensure the uniform temperature of the wafer for maximum deposition efficiency. The wafer-handling tool of APPLIED MATERIALS CENTURA is a highly automated, robotic module which is responsible for loading wafers from the magazine into the reaction chamber and unloading them after thin-film deposition. It is designed to enable fast and precise loading and unloading of wafers in order to optimize throughput. Finally, the controller of the asset is responsible for controlling the various parameters of the PVD process. It is also used to monitor and adjust the substrate temperature, gas flow rate, wafer position, RF power, and other process variables. This ensures that the parameters are maintained in optimal ranges for optimal deposition. Overall, CENTURA is a highly advanced thin film deposition model that offers reliable and repeatable thin film deposition processes for device fabrication. It is equipped with a variety of components and features to ensure maximum performance, efficiency, and precision. With its sophisticated controller equipment, it is capable of controlling the various parameters of the deposition process to ensure excellent results.