Used AMAT / APPLIED MATERIALS CENTURA #9101735 for sale

AMAT / APPLIED MATERIALS CENTURA is a high-performance, multi-purpose reactor designed for research and production of advanced semiconductor films and integrated circuits. The reactor is manufactured by AMAT, a company that specializes in automated process equipment and systems. AMAT CENTURA is a single-wafer, high-density plasma processing equipment featuring four low-pressure reactive gas sources, high-power microwave energy, and a proprietary in-situ measurement system. To improve process integration and on-wafer measurements, APPLIED MATERIALS CENTURA employs two distinct process modules that can be easily changed as required. The first module is a low-pressure chemical vapor deposition unit (LP-CVD). This module contains an inductively coupled plasma source, which is ideal for synthesis of thin films and surface modification of films with reactive gases. The second module is a plasma-enhanced chemical vapor deposition machine (PECVD). This module is used for deposition of silicon oxynitride, silicon nitride, doped silicon oxides, and other thin films. CENTURA features a low-cost substrate transfer tool, which reduces costly labor associated with wafer-processing. It also incorporates proprietary in-situ metrology equipment and ambient-temperature process monitoring, providing accurate and reliable measurements that can be adjusted to achieve optimal process results. AMAT / APPLIED MATERIALS CENTURA also includes a patented low-resistance effluent filter, which prevents hazardous particles from entering the atmosphere. AMAT CENTURA is capable of producing films with a wide range of properties, such as excellent electrical properties, superior thermal properties, superior surface morphology, and low recrystallization temperatures. APPLIED MATERIALS CENTURA utilizes the combination of high-power microwaves, inductively coupled plasma source, and multiple reactive gas sources for deposition of films with superior step coverage and thinner films for improved throughput. Its multiple gas sources allow for the deposition of films with decreasing resistivity and with low surface tension. In short, CENTURA is a state-of-the-art asset designed for research and production of advanced semiconductor films and integrated circuits. Its features include four low-pressure gas sources, high-power microwave energy, patented in-situ measurements, and a low-cost substrate transfer model. It is capable of producing films with excellent electrical properties, superior thermal properties, superior surface morphology, and low recrystallization temperatures. AMAT / APPLIED MATERIALS CENTURA also includes a patented low-resistance filter, which prevents hazardous particles from entering the atmosphere.