Used AMAT / APPLIED MATERIALS CENTURA #9121573 for sale

AMAT / APPLIED MATERIALS CENTURA is a large-scale, multi-purpose, production-scale semiconductor fabrication reactor built by AMAT. The equipment is designed to address the ever-increasing needs of the semiconductor industry for high-precision and high-yield components. The system includes state-of-the-art technology and a unique set of features to ensure superior production performance. AMAT CENTURA reactor is built on a gallium arsenide (GaAs) platform and is capable of creating virtual wafer sizes of up to 3.5 inches in size. It is capable of producing ultra-precision components for integrated circuit structure, thin films and high-density interconnect (HDI) substrates. The unit is designed to deliver full functionality for both deep reactive ion etching (DRIE) and physical vapor deposition (PVD) layers. The key features of the machine are its high duty cycle, excellent material characteristics, and exceptional process control. Its high-speed production capabilities enable it to quickly fabricate parts and reduce the operational cycle times for semiconductor fabrication. Its ion and photonic beam machining capabilities enable it to achieve the high accuracy needed by the industry. It is also capable of easily adapting to various process configurations and can be quickly reconfigured to accommodate demand. The tool can also provide a complete suite of process control capabilities, including real-time time monitoring and reporting of parameters, substrate registration and placement, particle control, chamber pressure and vacuum cleanliness, chamber profile sensing, and process parameter optimization. In addition, the asset has a wide range of automation options to effectively handle process changes and increase throughput, as well as a library of recipes for fast and reliable product fabrication. APPLIED MATERIALS CENTURA reactor is designed to address the highest level of quality requirements and delivers reliability and precision, while providing higher throughput and reducing costly time delays associated with manual processes. The model is ideal for production of high performance, high-resolution nanostructure structures with excellent controllability and repeatability.