Used AMAT / APPLIED MATERIALS CENTURA #9122659 for sale

AMAT / APPLIED MATERIALS CENTURA is a vacuum deposition equipment used for manufacturing semiconductor substrates, or wafers. It provides an ideal environment for a variety of process applications including chemical vapor deposition (CVD), physical vapor deposition (PVD) and atomic layer deposition (ALD). The system is made up of a number of components including a Vacuum Processing Chamber, which is the main processing chamber, a Showerhead deposition source, a Sublimation Source, and a Cryo-Thin Source. The Vacuum Processing Chamber has a vacuum rating of 10-8 Torr, and it is the main process chamber where the deposition of the thin films takes place. It is typically enclosed in ceramic material which provides additional stability and includes an in-situ purge port to vent out any unwanted particles. It also includes heating elements, temperature controllers and a cryogenic nitrogen blanket for temperature control. The Vacuum Processing Chamber has adjustable height, width and depth to allow for customized thin-film deposition. The Showerhead Deposition Source is a deposition source that is placed on the Vacuum Processing Chamber and it is used for the deposition of uniform thin films. It consists of a number of individually adjustable nozzle jets that can be precisely set to provide uniform films of desired thickness. The Sublimation Source is located between the Vacuum Processing Chamber and the Showerhead Deposition Source and it is used for the deposition of metal films. This source utilizes a heated source plate to vaporize the metal and then condenses it on the substrate in the form of thin films. The Cryo-Thin Source is a deposition source used for the uniform deposition of metal films on the substrate. It is placed between the Sublimation Source and the Showerhead Deposition Source and it is typically supplied with liquid nitrogen. It consists of a cryogenic nozzle and a heated fountain plate which is used to reduce the temperature of the metal atoms, leading to their uniform deposition on the substrate. AMAT CENTURA is a versatile vacuum deposition unit that can be used to produce a wide range of high-performance semiconductor substrates with perfect film adhesion and uniform thickness. It is a reliable, cost-effective machine that can be used to achieve excellent thin-film deposition for a variety of applications.