Used AMAT / APPLIED MATERIALS CENTURA #9155625 for sale

AMAT / APPLIED MATERIALS CENTURA
ID: 9155625
Chamber.
AMAT/AMAT / APPLIED MATERIALS CENTURA equipment is an advanced batch process reactor used in semiconductor processing. This system allows for full thermal and deposition control, enabling process stability and precise control over the entire fabrication process. AMAT CENTURA unit is equipped with advanced process control functionality, providing the highest precision and repeatability. It enables process adjustments to be made on the fly, allowing for optimal control over the process parameters. The machine also includes a comprehensive set of software tools that allow process engineers to accurately predict and set process conditions, enabling precise control over the process timeline. APPLIED MATERIALS CENTURA tool utilizes advanced heating mechanisms to achieve precise thermal processing. It includes a convection-based heated ambient gas headspace, an electro-powered external heating element and a DC heated laser support chamber. The gas headspace is designed to ensure that the asset maintains pressure control over the entire process. The external heating element ensures a precise thermal balance, enabling optimal thermal performance. The heated laser support chamber allows for precisely controlling the laser process parameters for highly precise deposition processes. CENTURA model offers a comprehensive range of standard and optional features to ensure optimal performance. It includes a large and easy-to-access wafer handling equipment, enabling precise loading and unloading of wafers and substrates. The system also contains a dual-source ion source for providing additional accuracy during ion implantation processes. In addition, AMAT / APPLIED MATERIALS CENTURA unit has a high-speed open RF and DC sputtering source, allowing advanced deposition processes with ultra-high resolution layers. AMAT CENTURA machine is highly customizable, enabling process engineers and scientists to achieve the precise process results they need. It is easily adapted to various environments, making it a great choice for new or existing semiconductor fabrication facilities. The tool also includes various safety mechanisms, ensuring the safety of both personnel and the asset itself. APPLIED MATERIALS CENTURA model is an advanced batch process reactor designed to meet the highest levels of precision and repeatability in semiconductor processing. Its cutting-edge features enable precise thermal and deposition control, enabling process engineers to achieve optimal process performance. The advanced heating and cooling mechanisms, coupled with high-speed open RF and DC sputtering sources, make this equipment an ideal choice for semiconductor fabrication facilities.
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