Used AMAT / APPLIED MATERIALS CENTURA #9157220 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9157220
PVD System.
AMAT / APPLIED MATERIALS CENTURA® reactor is an advanced semiconductor fabrication equipment used to manufacture microelectronic circuits for the production of computer chips, integrated circuits, and other sophisticated devices. AMAT CENTURA® is a highly efficient, self-contained reactor equipment that combines several different processing chambers and environments into a single piece of semi-automated equipment. The reactor consists of three main parts: the main chamber where the main process takes place, the pre-treatment and temperature control chambers, and the post-treatment and output chambers. At the heart of the reactor is the main chamber, which incorporates a variety of high-energy plasma sources, such as RF or microwave-generated plasmas, and further includes an ion source, a target source and a substrate source (wafers) to achieve desired processing results. The substrate source is used to load and unload wafers, while the ion source configures the ion type, ion energy and ion flux to optimize etching, deposition and polishing. The target source supplies a metal target, which serves as the source of a variety of materials during chemical vapor deposition. The pre-treatment chamber is used in a variety of processes, such as chemical cleaning, metal etching, thermal etching and surface activation, while the temperature control chamber is used to precisely control the temperature of both the target and the substrate before and during main processing in the main chamber. The temperature control chamber is an especially important component of APPLIED MATERIALS CENTURA® reactor system, as it allows for optimal etching, chemical vapor deposition, diffusion, or lithography processes. The post-treatment chamber is used for gas cleaning, thermal processing, and for final passivation. Additionally, CENTURA® reactor unit employs an advanced control machine to ensure precise, repeatable performance from one process run to the next. In addition, the reactor is designed to be modular and flexible in its operation, enabling it to adjust to changing applications. Overall, AMAT / APPLIED MATERIALS CENTURA® reactor is specifically designed to be a reliable, efficient, and highly configurable tool that can meet the demanding needs of the semiconductor fabrication industry. Its advanced plasma sources, temperature control capabilities, sophisticated gas management tool, and versatile modular design make it the ideal platform for both research and production applications.
There are no reviews yet