Used AMAT / APPLIED MATERIALS CENTURA #9160524 for sale

AMAT/AMAT / APPLIED MATERIALS CENTURA is an advanced dry-etch reactor designed to provide superior process performance, environmental safety, and cost reduction benefits to semiconductor manufacturers. This reactor utilizes industry-leading technologies to perform etching, anisotropic etching, and deep etching of both single-layer and multi-layer structures with exceptional precision and reliability. The equipment is constructed from a durable stainless steel body that is highly corrosion-resistant, and its low power requirements, sensor-controlled process controls, high throughput capabilities, and optional process monitoring and control functionality ensure efficient operation and accurate results. AMAT CENTURA is equipped with advanced etching technology, including ultra-high aspect ratio (UHAR) etching capabilities as well as dual-frequency power supplies. This allows superior performance in deep etches and larger process windows for difficult-to-etch materials. The system also includes an ultra-fast shutter unit, which reduces etching time and improves process throughput. In addition, a patented electrostatic chuck (ESC) technology enables optimal planarization and prevents x-ray damage to the wafer during processing. APPLIED MATERIALS CENTURA features optional features such as a PECVD module for fast oxidation and nitridation of the wafer and an advanced module for improving oxide etching uniformity. The machine also features advanced wafer mapping capabilities and process monitoring, allowing direct visualization of the etch profile and process history. In addition, CENTURA is capable of detecting process problems instantly, allowing corrective measures to be taken immediately. To ensure the highest levels of safety and reliability, AMAT / APPLIED MATERIALS CENTURA is equipped with a closed-loop gas delivery and control tool, an automated uniformity correction asset for wafer-level etch processes, and an integrated process control model for accuracy in maintaining critical process parameters. The equipment also includes an integrated plasma diagnostic system to help improve etching performance, as well as support for advanced process analytics to detect errors or process instabilities. Finally, AMAT CENTURA is designed to be both user-friendly and cost-effective, and its automated process controls, easy-to-use programming, and maintenance options make this unit ideal for both short and long production runs. When paired with its excellent process performance and reliability, APPLIED MATERIALS CENTURA is the ideal choice for any semiconductor manufacturer looking for Dry-Etch reactor technology.