Used AMAT / APPLIED MATERIALS CENTURA #9174767 for sale

AMAT / APPLIED MATERIALS CENTURA is an advanced chemical vapor deposition (CVD) reactor specifically designed for the deposition of conformal, pinhole free, high quality thin films. This type of reactor is extensively used in semiconductor and photovoltaic industries to produce a variety of thin film devices such as logic and memory chips, transistors, as well as solar cells. AMAT CENTURA is available in two general configurations: single chamber, four chamber and two chamber process tools. It is built with a dual wall quartz chamber design, allowing for efficient processing of materials in a wide range of temperatures. The first layer is composed of a Corning 7740 quartz, with a thickness of two to three millimeters, and an outer wall made of an additional two to three millimeters of thermal insulation. This provides maximum thermal efficiency and insulation from the outside environment. APPLIED MATERIALS CENTURA is specifically designed for differential atmospheric pressure processing. It has a superior turntable design for load lock, transfers, and high temperature processes. The turntable can move horizontally 180°, allowing the process tool to be easily move and relocated. CENTURA also provides a wide range of process gases, including hydrogen, argon, nitrogen, and oxygen. The available range of pressure and temperature is 20-1200 millibar and 300-1200°C respectively. The high performance of AMAT / APPLIED MATERIALS CENTURA is due to its advanced features. It has an intuitive graphical user interface (GUI) which is easy to use and enables efficient production of thin films. Additionally, it has an ultra-precise process monitoring and control system, capable of accurately recording and analyzing the process data. AMAT CENTURA is well suited for fabrication of high quality thin film components. Its dual wall quartz chamber design ensures high levels of reproducibility and repeatability. Furthermore, its wide range of process gases, pressure and temperature make it an ideal tool for a variety of thin film production applications. Finally, its intuitive GUI and process monitoring and control make it a reliable and safe tool for ensuring thin film quality and consistency.