Used AMAT / APPLIED MATERIALS CENTURA #9183325 for sale
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ID: 9183325
Wafer Size: 8"
Vintage: 2000
HDP-CVD System, 8"
Software version: B3.7_34
CIM: Linked
Hardware configuration:
Main system:
(1) Centura 5200
SMIF System: (2) Asyst SMIF Interfaces
Handler system: (1) HP ROBOT
Process chmber: (3) FHDP Chamber ultima
Hardware configuration (Subfab / Auxiliary units)
(1) SMC Heat exchanger
(3) ETO Generators
(2) CDO
(3) EBARA Pumps AAS70WN
Buffer / Loadlock EBARA Pump: (2) EBARA Pumps AA20N
Missing / Faulty parts / Accessories list
(1) RPS (AT APP pending to repair)
(1) Side match (At fab 35)
2000 vintage.
AMAT / APPLIED MATERIALS CENTURA Reactor is a highly versatile piece of silicon processing equipment used in the manufacture of semi-conductors. Its flexibility makes it a useful tool for a variety of projects, from small-scale prototyping to high production runs. AMAT CENTURA Reactor is a one-step, high-vacuum reactor for processing silicon substrates in a thermal processing chamber. This unique, patented design provides a highly uniform, low-dielectric-constant coating. The chamber is equipped with a quartz bellows-sealed, low-pressure-pumping system, coupled to a gas delivery system with rapid cycling valves and computer-controlled flow rates. This reactor is designed to reduce costly process steps while meeting industry requirements for film uniformity, reliability and yield. The reactor is primarily used to deposit tungsten silicide, titanium silicide, cobalt silicides and other silicide materials. It features a single chamber, which is 15 inches in height, two feet in width, and four feet in depth. The chamber is equipped with two independent electronic micro-processor controllers, several temperature and gas flow sensing systems, and a chamber view port. The temperature can be set from 50-1000⁰C, with a maximum processing temperature of 850⁰C. The reactor has interchangeable wafer carriers, accommodating wafer sizes from 3 to 8 inches in diameter. The Carriers provide precise horizontal and vertical location of each wafer. The centrifugal force provided by the turning carrier creates a surface charge, ensuring a consistent uniformity and thickness of the resulting film. APPLIED MATERIALS CENTURA Reactor is an invaluable tool for many semiconductor processes. With the versatility of adjustable parameters, including temperature, gas flow, pressure and reaction times, this reactor can improve efficiency while reducing cost and time in the manufacturing process. Its precise enveloping design, robust electronics, and precise gas and temperature control assures that the process results are consistent and precise.
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