Used AMAT / APPLIED MATERIALS CENTURA #9189948 for sale

AMAT / APPLIED MATERIALS CENTURA is a high-performance reactor developed by AMAT, used mainly in the semiconductor industry for lithography processes such as deep-UV and Etch processes. AMAT CENTURA platform is based on a multi-chamber, multi-zone configuration designed to maximize productivity and efficiency. It is equipped with high-temperature quartz etch, high-pressure vacuum deposition, and high-frequency plasma deposition systems. The multiple chamber design of APPLIED MATERIALS CENTURA equipment allows for better process performance when compared to single chamber systems. This is due to the improved temperature, pressure and uniformity measurements that are possible with the multiple chamber design. The multiple chamber design also provides increased gas throughput, allowing higher throughput rates while also improving the process uniformity. CENTURA system is capable of managing up to four separate process chambers. This allows for improved throughput and capability to run different processes simultaneously using the separate chambers. Each chamber is equipped with an independent controller for the different process parameters, such as temperature, pressure, and deposition rates. It's designed for temperature accuracy, which allows accurate control over the etching and deposition steps. The unit also features vacuum deposition technologies such as plasma enhanced chemical vapor deposition and atomic layer deposition, enabling more complex structures to be produced. AMAT / APPLIED MATERIALS CENTURA also features high-frequency plasma deposition for reducing cycle time and improved uniformity. The high-frequency plasmas have a greater tolerance for boron, which can be used to reduce cycle time as well as making high-k dielectrics deposition much easier. The machine also includes safety mechanisms such as gas boxes, active exhaust, and piezoelectric sensors, which monitor the various process parameters. This ensures the tool is safe to use and the processes adhere to the highest possible safety standards. The asset is also designed to minimize contamination and maximize efficiency, and the user interface makes it easy to monitor and adjust the various parameters. In conclusion, AMAT CENTURA is a powerful and efficient reactor model with multiple chambers and zones that improves productivity and efficiency while allowing for improved temperature, pressure and uniformity measurements. APPLIED MATERIALS CENTURA platform can manage four separate chambers, and is equipped with vacuum deposition, high frequency plasma deposition, and safety mechanisms to ensure the safety of users and quality of the produced parts. With this, it is an ideal tool for any high-precision lithography processes.