Used AMAT / APPLIED MATERIALS CENTURA #9196871 for sale

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ID: 9196871
Wafer Size: 8"
Radiance chambers, 8" With peripherals.
AMAT / APPLIED MATERIALS CENTURA is a Chemical Vapor Deposition (CVD) reactor that is commonly used in the semiconductor industry to deposit high quality conformal films onto substrates. The CVD process involves the conversion of a phase of matter, typically a gas or vapor phase, into a thin solid film. AMAT CENTURA is specifically equipped with a large quartz reaction chamber that efficiently distributes precursors over a given substrate. Additionally, precise control of the process is enabled by the integrated heater and associated temperature control systems, allowing for layer thickness control and uniformity under vacuum conditions. APPLIED MATERIALS CENTURA is a metal-organic chemical vapor deposition (MOCVD) reactor that allows for independent zone temperature control. This is achieved by a multi-zone RF bias, which applies precise heating over a wide range of temperatures from 100 degrees to 1000 degrees Celsius. Likewise, maintains clean and precise thermal cycling during the deposition process. Furthermore, its quartz process chamber volume enables larger processing and deposition of films required for MEMS (microelectromechanical systems) as well as other applications. CENTURA is designed for applications needing conformal deposition of thin films, including silicon nitride, polysilicon and many other films which require uniform and repeatable deposition processes. AMAT / APPLIED MATERIALS CENTURA allows for a high degree of flexibility with regards to the materials used in the deposition process. It can be used with a variety of precursors, including those necessary for Silicon, Germanium, Germanium-Silicon, Inductively Coupled Plasma (ICP) and High Temperature Metal Organic Chemical Vapor Deposition (HTMOCVD). Furthermore, AMAT CENTURA supports various types of deposition cycles, such as high pressure Fast Thermal Chemical Vapor Deposition (FTCVD) and low pressure Plasma Enhanced Chemical Vapor Deposition (PECVD). APPLIED MATERIALS CENTURA is also equipped with multiple sources of feedback and metrology such as a large quartz viewing window, pyrometer, and hot wire anemometer. These enable the user to monitor and adjust deposition parameters as needed. CENTURA is available in multiple sizes to fit specific industrial needs. Furthermore, the configuration of the reactor is fully customizable, allowing for specific material requirements. The reliability and cost effectiveness of AMAT / APPLIED MATERIALS CENTURA make it especially attractive for the semiconductor industry.
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