Used AMAT / APPLIED MATERIALS CENTURA #9203384 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
AMAT / APPLIED MATERIALS CENTURA is a type of chemical vapor deposition (CVD) reactor that is used to create thin layers of various materials on a substrate. The equipment consists of a main chamber, chamber walls, and a susceptor, which holds the wafers in place during the deposition process. The chamber is equipped with two sensors that monitor the pressure inside the reactor. The reactors can also accommodate a range of precursors, such as silane, phosphine, and boron trichloride, which are used to deposit the layers of material. AMAT CENTURA system is designed to offer complete process control and monitoring, as well as to provide a clean environment. The chamber walls are made from a high nitride quartz material that helps to reduce outgassing and diffusion during processing, which helps to ensure a consistent, high quality finished layer. The chamber walls have multiple baffles on both the top and bottom and are filled with nitrogen to help create the ideal environment within. In addition, the chamber walls and door feature an exhaust unit to ensure a continuous flow of air to the chamber, helping to reduce impurities or contaminants that can tarnish the final layer. The susceptor is also important in the process of deposition and is typically attached to a heated pedestal that helps to maintain an even temperature throughout the substrate during the process. The wafers, which are coated with a sacrificial layer of materials such as titanium nitride, are loaded onto the susceptor via a robot arm. The robot arm is also responsible for positioning the wafers during the deposition process and for removing them once the process has been completed. APPLIED MATERIALS CENTURA systems are designed for a range of applications, allowing users to produce thin films of metals, semiconductors, insulators, and dielectrics. The machine is also capable of depositing materials such as gallium arsenide, indium phosphide, and tin oxide. The deposition process is fully enclosed, ensuring that any contaminants or impurities will not be introduced during the deposition process, which allows for completely clean and consistent layers of materials. Finally, the tool has been designed with a user-friendly interface and a range of safety features, making it easy to operate and maintain.
There are no reviews yet