Used AMAT / APPLIED MATERIALS CENTURA #9218563 for sale

AMAT / APPLIED MATERIALS CENTURA (AMAT CENTURA) reactor is a specialized processing chamber designed for high-volume, high-temperature etching, deposition and surface engineering applications. Utilizing advanced plasma technologies, APPLIED MATERIALS CENTURA reactor can be used for a variety of wafer fabrication processes such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and ion implantation. This all-in-one process is an efficient and cost-effective solution for all fabricators, regardless of the application or complexity. CENTURA reactor is an advanced plasma technology that utilizes an electron cyclotron resonance (ECR) induction field. This ECR provides the highest temperature plasma conditions that exceed any other deposition method available, and is ideal for applications at high process temperatures such as curing epoxy and glasses. The sophisticated technology of the ECR plasma source allows for a wide range of process conditions and parameters to be easily adjusted for maximum process yield and performance. AMAT / APPLIED MATERIALS CENTURA reactor can be used to deposit a wide variety of materials including oxides, nitrides, and oxynitrides. It can also be used to etch silicon, oxides and photoresists, including high-aspect-ratio structures. The reactor's unique custom chamber design allows for high-throughput production, with faster etching and deposition speeds than other plasma processing methods. AMAT CENTURA reactor also incorporates a unique multizone weight loading system, which allows for full flexibility in the loading and unloading of wafers. This makes the system perfect for tight integration into various processes, and allows for increased throughput times for loading and unloading wafers. The power supplies are designed to provide ultra-low noise levels, and protect from any fluctuations during process runs. APPLIED MATERIALS CENTURA reactor is an advanced plasma processing tool that offers unparalleled performance in etching, deposition and high-temperature applications. It provides excellent temperature control for process stability, and is designed for maximum throughput. With its excellent low-noise power supply, superior multizone weight loading system and reliable ECR induction field, CENTURA reactor is an ideal choice for all your plasma processing needs.