Used AMAT / APPLIED MATERIALS CENTURA #9227018 for sale

AMAT / APPLIED MATERIALS CENTURA is a high-vacuum, chemical/physical vapor deposition (CVD/PVD) reactor. This type of CVD/PVD reactor is often used for high-performance applications such as microelectronics and optoelectronics. The key components of AMAT CENTURA reactor include a process chamber, a vacuum pump, a deposition source, a gas panel, and a process control equipment. The process chamber is the main component of the reactor and consists of a sealable chamber and a door system that can be opened and closed to regulate the atmosphere in the chamber. Inside the process chamber, the gaseous reactants are introduced into a vacuum environment created by the vacuum pump. The reactants are then exposed to a high temperature, typically up to 1100 °C, which is set by the deposition source. The deposition source can be an electron-beam evaporator, an inductively coupled plasma source, or a resistive evaporation source, depending on the application. The gas panel installed in APPLIED MATERIALS CENTURA reactor is responsible for introducing the reactants into the process chamber according to the specific parameters established by the user. It is also capable of controlling the rate and percentage of gas used. Additionally, the gas panel includes sensors and shut-off valves that allow the user to control the flow and activation of each component of the depositing mixture. The process control unit is responsible for controlling and monitoring the parameters of the reactor chamber. The process control machine is able to sense the deposition rate and the temperature of the deposition substrate, as well as the pressure of the chamber atmosphere. It also has parameters to adjust the temperature, working atmosphere, and other variables as needed to optimize the deposition process. CENTURA reactor is a powerful tool that has been widely used in the microelectronics and optoelectronics industry for several decades. Its high-vacuum capability, its sophisticated deposition sources, and its strong process control tool allow for the creation of highly sophisticated and complex microstructures needed for the most advanced materials technology applications.