Used AMAT / APPLIED MATERIALS CENTURA #9236582 for sale

AMAT / APPLIED MATERIALS CENTURA is a chemical vapor deposition (CVD) reactor capable of delivering a wide range of processing solutions for the deposition of thin films. The CVD reactor utilizes chemical sources, heated surfaces and other forms of energy, such as plasma, to deposit thin layers of polycrystalline, amorphous and, in some cases, directly bonded alloys or other compounds onto various substrates. Used primarily in the production of semiconductor chips, AMAT CENTURA is capable of depositing layer thicknesses that range from a few angstroms up to several microns, with a maximum deposition rate of 2 microns/hour. The chamber of the CVD reactor provides a vacuum environment that allows for the reliable growth of complex thin film structures and the deposition of advanced materials. APPLIED MATERIALS CENTURA uses several gas introduction systems, including separate evacuation and introduction modules, to enable the precise control of processing and substrate temperature. The CVD reactor also features an advanced optical equipment for accurate in-situ observation and measurement of the deposition processes. The system also incorporates a number of safety sensors, an advanced quench unit, an oxide encapsulation machine and an automated maintenance tool, all of which ensure a safe and efficient operation. CENTURA CVD reactor is designed for both commercial and research applications. The reactor's chamber is constructed from corrosion-resistant stainless steel and is surrounded by highly insulated walls that prevent heat transfer away from the chamber, resulting in a highly efficient process. The interior of the chamber is illuminated by special illumination sources, providing an environment suitable for a wide variety of CVD deposition processes. AMAT / APPLIED MATERIALS CENTURA CVD reactor's advanced process control asset ensures accurate and repeatable deposition results as well as efficient utilization of gas sources. The on-board computer-based automated process control model also provides detailed data on the process environment and allows users to easily optimize the deposition process. Finally, the CVD reactor is equipped with an automated cleaning equipment which reduces downtime and ensures long-term reliability. In addition, the system's modular design allows for easy maintenance and upgrading in the future. Therefore, AMAT CENTURA CVD reactor is an ideal choice for both commercial applications and research needs.