Used AMAT / APPLIED MATERIALS CENTURA #9237390 for sale

AMAT / APPLIED MATERIALS CENTURA is a low temperature polysilicon deposition reactor that produces polysilicon films. AMAT CENTURA polysilicon reactor (AMAT) is used in the manufacture of many microelectronic components. APPLIED MATERIALS CENTURA polysilicon reactor typically operates at temperatures of between 500 and 600 Celsius to produce films with a purity of 99.999%. CENTURA polysilicon reactor consists of a multi-level quartz tube which is referred to as a "stack". The stack contains several layers of quartz, quartz baffles and a reaction chamber. The upper and lower quartz tubes form the walls of the reaction chamber, while the intermediate quartz baffles are thermally-isolated metal components that act as barriers to spread the heat energy. The reaction chamber is heated by a high temperature induction heater and hot hydrogen supply line from the feedstock. AMAT / APPLIED MATERIALS CENTURA polysilicon reactor is designed to produce films with a high purity, uniform crystalline structure, and a high degree of control over the films characteristics. It is also capable of fine-tuning the deposition rate and properties of the films to optimize the desired results. During operation, silicon powder is introduced into the reaction chamber, which is exposed to a combination of high temperature and pressure. The hot hydrogen gas mixed with silicon powder vaporizes to form individual silicon particles which, upon contact with the hot walls and quartz baffles, react and deposit onto the substrate to produce films. The films are then post-processed, cooled, and cut into wafers for subsequent processing or packaged for shipment. The deposition rate of AMAT CENTURA reactor can be controlled to ensure that thin films with good surface properties can be achieved. The use of an advanced gas delivery system reduces the production time for a single wafer cycle and provides improved process control. APPLIED MATERIALS CENTURA system's ability to produce thin films that are extremely uniform in size and shape makes it an ideal choice for manufacturers of thin-film components such as MEMs, integrated circuits and photovoltaic cells. Its ability to precisely control the deposition rate, uniformity, and film characteristics makes it a powerful tool in the microelectronics manufacturing process.