Used AMAT / APPLIED MATERIALS CENTURA #9245641 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9245641
Wafer Size: 12"
CVD System, 12" Includes: 0010-08687 Upper chamber A Ultima X HDP-CVD 0010-08687 Upper chamber B Ultima X HDP-CVD 0190-02955 Centura factory interface FFU-AMT -S1 0010-23250 Monolith unplat, 12" ADVANCED ENERGY 3155120-001 A RF Rack 330241-D3GP Gas box platform, 12" (2) SMC CORPORATION INR-498-011B Thermo chillers 0190-4213, 1B05180G03 HDP-CVD Primary AC distribution, 12" Factory interface components: (2) NEWPORT KENSINGTON 25-3700-1425-08 Robots (2) KENSINGTON LABORATORIES Servo positioning controllers (2) TKD CORPORATION TAS300, 02TF12953, 0190-17837 Load ports KENSINGTON LABORATORIES 25-3600-0300-03 Wafer indexer RF Rack components: (2) ADVANCED ENERGY A3H0C200BA120G001A RF Generators, 10 kW/13 (2) ADVANCED ENERGY HFV 8000, 3155083-180A, 0920-0112 RF Generators Robot NSK Driver (2) RPS Units Missing parts: Interconnect cables Controller cabinet.
AMAT / APPLIED MATERIALS CENTURA Reactor is a tool used to construct nano structures, using epitaxial techniques. It is a versatile, flexible and efficient semi-conductor fabrication equipment. It has three chambers and uses a 13.56 MHz RF source to deliver energy to the substrate, allowing highly precise deposition and etching. The primary chamber of AMAT CENTURA Reactor is the substrate deposition system. This unit is used to deposit the device material onto the substrate and is controlled with a quartz crystal pressure balanced, high-resolution stepper motor. This machine can be adjusted for different processes such as sputtering, DC magnetron sputtering, torch sputtering, and plasma enhanced chemical vapor deposition (PECVD). This tool is also capable of handling multiple substrates of various sizes simultaneously. The second chamber of APPLIED MATERIALS CENTURA Reactor is the epitaxial asset. This chamber features a RF bias for placing a bias on the substrate, allowing for direct writing of the desired nanostructures using the electron gun. This model is also capable of etching the desired nanostructures with a very high precision and a high speed. This chamber also allows for annealing the devices, a step needed to stabilize the device material. The last chamber of CENTURA Reactor is the metrology chamber, which includes metrology tools such as an optical microscope, an atomic force microscope (AFM), a scanning electron microscope (SEM), and an ellipsometer. The use of these tools allows for high resolution imaging of the nanostructures, as well as kinetic analysis of their properties. AMAT / APPLIED MATERIALS CENTURA Reactor is a reliable, high-performance tool for fabrication of nanostructures. With its three chambers and finely tuned RF systems, this tool can be used to fabricate nanostructures of the most intricate designs with a very high precision and speed. Its versatility and efficiency make it a cost effective, reliable and an excellent choice for any nanostructure fabrication application.
There are no reviews yet