Used AMAT / APPLIED MATERIALS CENTURA #9250769 for sale

ID: 9250769
Wafer Size: 12"
Vintage: 2009
Oxide etcher, 12" (3) Enabler chambers RF Generator rack AC Rack Missing parts: GHW50A (3) B5002 EFEM Buffer chamber RF Generators Robot 2009 vintage.
AMAT / APPLIED MATERIALS Centura Enabler is a chemical vapor deposition (CVD) reactor designed for a range of semiconductor processes. It enables the growth of thin-films and barrier layers from CVD precursors to form complex and fine structures on a variety of workpiece substrates. AMAT Centura Enabler features an advanced, single-wafer process chamber that is capable of readily accommodating rapid temperature ramping. This chamber enables uniformity of within 0.3°C across the entire wafer, allowing for enhanced performance and improved process reliability. The Enabler is outfitted with a Flex Temperature Control Design - a patented feature which creates an oxygen-free environment reducing contamination and prolonging wafer lifetime. This technology allows for precise control of temperature without compromising process critical dimension (CD) accuracy. Workpiece thermal processing capabilities are increased with APPLIED MATERIALS Centura Enabler, as it enables the precise delivery of gases for a wide range of processes while at the same time providing unparalleled control of substrate temperature. The reactor is also equipped with a duplex gas panel and multi-source, high-speed gas valve, both of which are fully customizable to best fit the needs of the fabrication environment. Centura Enabler incorporates an advanced PID control loop to manage the furnace temperature and pressure. This control loop is adjustable to optimize performance in both high and low temperature settings and ensures accurate temperature control during the deposition of materials. The reactor also features a low-pressure plasma source and remote plasma control. This allows for accurate plasma control and allows for the use of a wide variety of process chemistries. AMAT / APPLIED MATERIALS Centura Enabler is designed with high productivity in mind, and is outfitted with a rapid thermal cycling system. This makes possible high-speed heating and cool-down time, allowing users to increase production throughput. The reactor also incorporates parallel process chamber technology to support multiple processes. AMAT Centura Enabler is ideal for both prototype and production fabs looking to increase yield and reliability. With its comprehensive and flexible features, it is an invaluable tool for the modern semiconductor industry.
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