Used AMAT / APPLIED MATERIALS CENTURA #9282471 for sale

ID: 9282471
System (5) AMAT Enabler (3) Chamber Enabler (1) Generator rack (1) EFEM with YASKAWA Robot VHP Robot TDK Loadport.
AMAT / APPLIED MATERIALS Centura Enabler is a versatile reactor designed for a range of advanced processes. It features an advanced quartz-powder form which makes it ideal for high temperature processes and ultra-flat surface profiles. It also offers low cost, low maintenance, and high reliability. The Enabler has been designed with a variety of features to meet the demands of high function, high complexity processes, such as low temperature oxide growth and copper etching. The Enabler also has advanced capabilities such as vacuum deposition, electrochemical, thermal oxidation, etching, metal deposition and thin film deposition processes. The Enabler is designed to make the most out of a single chamber. It has a small footprint and low operating costs. The Enabler is capable of making high quality features with the most repeatable results. For instance, when using the Enabler for thin film processes, it is possible to create structures that are up to 37 nm wide and featuring both line width control and critical dimension fidelity. The Enabler also provides ultra-high throughput and low temperature processes. Its design combines high accuracy and multi-chamber access for parallel processes. This enables the creation of larger surfaces and intricate structures which would otherwise be difficult to achieve. This is particularly useful for wafer level processes such as dielectrics, which can be deposited at speeds of up to 270 nm/min. The Enabler also boasts integrated process control, which allows for high process asset utilization. It also offers user-friendly software control to provide a seamless integration of the process parameters. This ensures consistent software operation, and enables gap control and substrate uniformity. The Enabler is highly capable, making it an ideal choice for a range of advanced processes. Its design and features make it an excellent choice for both established processes and new research or development. Its capabilities, combined with low cost, low maintenance, and the high reliability all make it a great choice for a range of applications.
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