Used AMAT / APPLIED MATERIALS CENTURA #9355266 for sale

AMAT / APPLIED MATERIALS Centura Enabler is a revolutionary transition metal chemical vapor deposition (TM-CVD) reactor. It features the latest in plasma-surface interaction technology and an advanced PECVD-CVD compatibility to enable unique and innovative substrates. The Enabler is designed to accelerate the development of advanced insulating materials, such as high-k dielectrics and barrier films for enhanced packaging integration. The Enabler is built on a robust platform featuring an advanced reaction chamber, temperature control, and deposition system. It is an open system and compatible with multiple gases to support multi-layer processes. With its efficient design, the Enabler offers high throughput and long-term reliability with minimal maintenance and downtime. Its full automation control and data retrieval provide superior performance and flexibility for complex process and applications. The Enabler offers high-rate deposition for a range of advanced materials. It is a reliable platform for producing high-quality dielectrics and interconnect films for advanced devices. Its dual power supplies and multi-frequency source coils enable multiple process windows, allowing for superior control over the deposition rate and composition. The Enabler is capable of producing high-quality interface layers for CMOS devices with extremely low nitrogen absorption. This is ideal for low-k materials and future-generation integration. As a result, it has been globally adopted by leading foundries and universities for thin-film equipment and processes. Additionally, with its low-cost, compact size, and efficient technology, the Enabler can help reduce the cost of materials and expand process capabilities. This will drive the development of high-performance materials and deliver a more cost-effective and reliable process. AMAT Centura Enabler is an advanced TM-CVD reactor with an advanced plasma-surface interaction technology and PECVD-CVD compatibility. It enables the development of advanced insulating materials, and its advanced features enable multiple process windows and multiple gases. Its dual power supplies and multi-frequency source coils enable superior control over deposition rate and composition. The Enabler is an excellent platform for producing high-quality dielectrics and interconnect films with low nitrogen absorption. Cost-effective, compact, and efficient, the Enabler is an ideal solution for low-k materials and is globally adopted for thin-film equipment and processes.