Used AMAT / APPLIED MATERIALS CENTURA #9382907 for sale

AMAT / APPLIED MATERIALS CENTURA
ID: 9382907
Wafer Size: 12"
Vintage: 2008
Etcher, 12" (3) chambers HDD Not included 2008 vintage.
AMAT / APPLIED MATERIALS Centura Enabler is a state-of-the-art reaction equipment designed for etch and deposition processing of semiconductor materials in advanced fabrication technologies. It provides an ultra-stable platform for high accuracy, high speed small feature size etch processes and enables deposition of epitaxial and nano-scale technologies. AMAT Centura Enabler reaction system combines an advanced gas delivery unit, high-efficiency vacuum pumps and integrated control technology to enable precise control of reaction conditions for complex fabrication processes. The machine is designed for optimal operation in an integrated platform, with an advanced graphical user interface (GUI) for easy setup and operation. APPLIED MATERIALS Centura Enabler includes multiple high-efficiency vacuum pumps, which are capable of achieving high quality and rapid response to process parameters. Its integrated gas delivery tool, the C2gEX™, features a combination of externally pumped and internally pumped gas delivery, allowing for superior stability and accuracy. The asset also includes a unique control model that enables precise control over the deposition and etch process parameters. This includes advanced features such as pressure control, gas flow control, anode power regulation, and temperature control. In addition to its advanced features, Centura Enabler also offers excellent uniformity and superior repeatability. The equipment is designed for optimum safety and stability, with built-in safety features such as fire protection and a failsafe plasma start module. The system also offers low temperature operation and low thermal stress for improved reliability and decreased process downtime. AMAT / APPLIED MATERIALS Centura Enabler is an ideal solution for advanced etch and deposition processes. It offers superior performance and precise control, making it a preferred choice for many semiconductor fabrication processes. The unit is designed to meet the highest industry standards, providing reliable, repeatable results for a variety of applications. It is also designed to be compatible with the most innovative and advanced materials, allowing for the highest yields possible.
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