Used AMAT / APPLIED MATERIALS CENTURA #9384520 for sale

ID: 9384520
CVD System ICP.
AMAT / APPLIED MATERIALS CENTURA reactor is a medium-scale deposition tool designed for use in scientific research and industrially-oriented applications. It is a high-performance, efficient, and reliable tool suitable for a range of technological applications, from the growth of thin-film materials, such as semi-conductors and polymers, to etching and doping. In general, AMAT CENTURA reactor consists of three main parts: a chamber for gas delivery, the source, and the substrate holder. The gas delivery chamber houses gas sources such as chemicals (oxides, halides, hydrides, etc.), inert gases, and dopants. The source, or target, generates a beam of material or energy, depending on the respective reaction or deposition type. This beam is then directed onto substrate placed in the substrate holder, which is designed to allow precise control over the position of the substrate. This generation and directed transportation of material and energy is regulated by a range of components, such as gas regulators and shutters, beamline elements, and photon power supplies. The various structural components of APPLIED MATERIALS CENTURA- including its chamber, source, and substrate holder- are connected and coordinated via a powerful computerized console. This console allows for precise and complex control of the deposition process and delivers superior performance, with an average wafer-thickness uniformity of +/-0.1 microns. Furthermore, the console is extremely user-friendly, enabling sample loading and remote operation, and includes features such as recipe programming and real-time process monitoring CENTURA reactor is highly reliable, able to perform consistently and accurately without fail. It is able to create thin-film materials with high quality and outstanding graphitization and oxidation resistance, while offering significant reductions in energy consumption by way of its improved system architecture and efficient power control. Overall, operation of AMAT / APPLIED MATERIALS CENTURA reactor is straightforward and dependable and provides outstanding performance. Its excellent temperature uniformity and high deposition rates mean that it is an appropriate tool for a wide range of thin-film deposition processes. It is also highly efficient and reliable, making it a cost-effective, top-of-the-line depositions tool, perfect for any industrial or research application.
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