Used AMAT / APPLIED MATERIALS CENTURA #9386335 for sale

AMAT / APPLIED MATERIALS CENTURA
ID: 9386335
Wafer Size: 12"
Etcher, 12" (2) Minos Carina Axiom.
AMAT / APPLIED MATERIALS CENTURA Reactor is a combination of advanced deposition equipment and material management capabilities, providing unique chemical vapor deposition (CVD) process and equipment solutions for semiconductor wafer fabrication. AMAT CENTURA is a modular, versatile system and is capable of achieving up to 92 percent of the full wafer fabrication production rate. APPLIED MATERIALS CENTURA Reactor is composed of two main components: the cathode and an anode. The cathode is the main source of the CVD deposition and is composed of a gas inlet, a reaction chamber, and a gas exhaust port. The anode serves as an electron source, while the reaction chamber is used to create a plasma from a reactant gas, which is then propelled onto the wafer surface. The gas inlet controls the flow of the reactant gases, allowing for precise control of the CVD process. CENTURA Reactor has a wide range of capabilities, allowing for production of a variety of chip-level devices such as interconnects, diffusion regions, memory alloy features, and other features. It also has the capability to deposit thin films of materials such as aluminum and nickel. AMAT / APPLIED MATERIALS CENTURA Reactor can also perform wafer post processing, such as chemical-mechanical polishing, diffusion cleaning, and patterning. AMAT CENTURA Reactor's single wafer handling unit allows it to complete all steps of the CVD process in a single pass at high speeds, increasing production efficiency and productivity. The SPC (Statistical Process Control) software enables precise control of the CVD process, ensuring reproducible results and excellent yields. APPLIED MATERIALS CENTURA Reactor is designed to operate in a fully automated vacuum machine, ensuring reliability, repeatability, and reproduction of the process. The tool allows for the efficient sharing of recipes and process information between wafers and multiple production sites, increasing efficiency and throughput. CENTURA Reactor also has the capability to operate in a hybrid reactor environment, allowing it to be used with other reactors in the same asset. AMAT / APPLIED MATERIALS CENTURA Reactor is a powerful and versatile model, offering complete control over the CVD process and enabling it to produce a variety of complex devices. It is an indispensable tool for semiconductor device manufacturers, as it offers excellent yields, high production speeds, and low operating costs. The equipment is well-suited for high-volume wafer fabrication and is an ideal solution for chip-level devices.
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