Used AMAT / APPLIED MATERIALS CENTURA #9390594 for sale

AMAT / APPLIED MATERIALS Centura Enabler is a reactor designed for creating large area thin film deposition processes. It is an industrial grade deposition equipment that prepares the wafer for the deposition process. AMAT Centura Enabler is designed to facilitate the growth, modification, and repair of thin films with high uniformity and homogeneity. The system features a computer-controlled, temperature-managed chamber that allows for precise control of wafer temperature during deposition. The unit utilizes a patented advanced low pressure deposition process, that enables ultra-thin films to be deposited in a uniform nature over large areas. This low pressure process eliminates the need for bottom and side shielding, which improves throughput and productivity. The chamber features a low-velocity nitrogen environment, that allows for the rapid transfer of material to the substrate. The nitrogen environment also improves process uniformity and coherence by preventing variations in deposition rate. This allows for a more even distribution of material deposited onto the substrate. Although APPLIED MATERIALS Centura Enabler can be used for a variety of material deposition processes, it is specifically well-suited for highly volatile oxide films. Centura Enabler also features advanced imaging capabilities, enabling the machine to locate and measure features down to 25 nanometers. Its fast auto-focus feature also enables users to obtain quality imaging data in the shortest time possible. The dynamic autofocus also ensures that the imaging targets are accurately registered on the substrate even with the slightest of topographic variations in the sample surface. The tool also features a numeric display that allows users to precisely coordinate and set the position of their samples. This precision positioning of the wafers allows for exact and repeatable measurements for process and yield integrity. AMAT / APPLIED MATERIALS Centura Enabler is an advanced, industrial-grade asset that enables the deposition of high-quality, uniform, and homogenous thin films onto substrate wafers regardless of material type. The model also features advanced imaging capabilities, and precise positioning of substrates for consistent and repeatable measurements. This enables high-throughput process results with high yield integrity and quality.