Used AMAT / APPLIED MATERIALS CENTURA #9409984 for sale

AMAT / APPLIED MATERIALS CENTURA reactor is a comprehensive solution for a wide range of complex etching and deposition processes used in the semiconductor circuit manufacturing industry. The reactor is characterized by its high dose rate, precise control of various process parameters, as well as its utilization of specialty gases or combinations of gases for deposition, etching, and cleaning. The reactor has a closed chamber, with a design that maximizes uniformity and precise etching. It utilizes a variety of gases, such as oxygen, nitrogen, and argon, in order to control the temperature, pressure, thickness, and surface quality of the etch region. Process gases can be stored and distributed directly from the reactor, with systems having up to 10 integrated gas lines. The Argon-oxygen mix is capable of etching tungsten and aluminum films, for example. The closed-chamber design also significantly reduces particle deposition and contamination. This is a major advantage over other designs because the contamination that occurs has a detrimental effect on product uniformity and yield. The Human Machine Interface (HMI) features a large touchscreen that simplifies process interaction and adds a level of control and accuracy that is not available on less advanced etching systems. In addition to its sophisticated controls, AMAT CENTURA reactor also features a combination of sensors, cyclers, and controllers. This allows for different combinations of gases to be used for etching or deposition and for accurate control of process variables. The sophisticated Materials Analysis System (MAS) allows for quick and reliable diagnostics. This is performed in real-time, meaning characterizations can be made immediately and the process can be adjusted accordingly. The MAS also has built-in wafer mapping capabilities and can measure not just the width of a feature but also its sidewall angle. In conclusion, APPLIED MATERIALS CENTURA reactor provides a powerful, versatile and highly accurate system for etching components in the semiconductor manufacturing industry. The sensitivity of the system allows for precise control of the various parameters, thereby ensuring a consistently high quality product. The reactor also features an innovative and sophisticated HMI, which simplifies both the application and characterization of products. Finally, the combination of sensors, cyclers and controllers make for an intuitive and consistent process, which helps ensure consistent yield and product quality.