Used AMAT / APPLIED MATERIALS Chamber for Centura #293663175 for sale

AMAT Centura Chamber is a chemical vapor deposition (CVD) reactor used for a variety of applications, such as depositing thin film solar cells, memory storage devices, display technology, and photovoltaic cells. The chamber consists of a reaction chamber, a source chamber, a parameter chamber and a controlled atmosphere chamber. The reaction chamber contains the substrate holder and is the largest component of the chamber. It is heated by an infrared lamp with an adjustable temperature range from room temperature to 350 degrees Celsius. The chamber is designed for high throughput, and it can process up to 800 substrates at a time, depending on the chamber size. It has a quartz window on the top to allow for viewing of the deposition process. The source chamber is used to introduce the necessary reactants for deposition and is located below the reaction chamber. It contains an injector and is heated up to 250 degrees Celsius to allow the reactants to vaporize. The heated reactant vapors travel to the reaction chamber from the source chamber, where they are then deposited onto the substrate. The parameters chamber is used to monitor and control the deposition process and is temperature controlled from room temperature to 250 degrees Celsius. Lastly, the controlled atmosphere chamber manages the atmosphere in the chamber during the deposition process and can be switched from inert to active atmospheres. This is important to achieving consistent high quality and repeatable results. APPLIED MATERIALS Centura Chamber is an advanced CVD reactor designed for high performance and repeatability in thin film deposition applications. By offering both versatile and precise control of the deposition process, the chamber has become a valuable tool for designers around the world.