Used AMAT / APPLIED MATERIALS Chamber for P5000 #293634883 for sale

AMAT-APPLIED MATERIALS P5000 Chamber is a high-performance reactor designed for use in semiconductor fabrication processes. This chamber is used to create a vacuum, which facilitates etching and deposition of different materials on semiconductors. The chamber includes a uniquely designed, robotic arm for handling wafers, which allows for efficient, accurate manipulation of the semiconductor materials. The P5000 Chamber features an air-bearing, triple-axis motion platform that moves the robots from substrate to substrate with precision. This motion platform is capable of achieving a controlled speed of up to five inches per second. Additionally, the chamber features an automated temperature control equipment that provides a uniform, temperature-controlled environment for the wafers during processing. The chamber is equipped with a vacuum system that creates a tight seal at the basechamber. This unit creates a vacuum of up to 10-7 Torr. The chamber is then equipped with a gas delivery machine, which enables the user to choose a variety of gases such as Helium, Argon, and Nitrogen to create the desired atmosphere for the deposition or etching process. In addition to its excellent vacuum tool, the P5000 is also equipped with a state-of-the-art scanning electron microscopy asset. This model makes use of an ultrahigh-definition electron beam which is capable of resolving features as small as 0.005 microns. This level of resolution enables the user to monitor the deposition or etching process in real-time, and make any necessary adjustments before the process is completed. Overall, AMAT / APPLIED MATERIALS-AMAT P5000 Chamber offers outstanding performance and reliability for the etching and deposition of semiconductor materials. The chamber is capable of operating under extreme conditions, and due to its robust design, offers long-term reliability. Therefore, it is the ideal choice for fabricating high-performance, reliable semiconductor products.