Used AMAT / APPLIED MATERIALS Chamber for P5000 #293634885 for sale

AMAT (APPLIED MATERIALS) P5000 Chamber is a single-wafer, batch reactor designed to provide precise control of deposition fluids across a wide range of temperatures. The chamber features a state-of-the-art design that reduces particle contamination and avoids non-uniformity by maintaining an extremely low uniformity temperature profile within the reactor. AMAT / APPLIED MATERIALS P5000 Chamber includes a high-performance, high temperature heating equipment for precise temperature control. This heating system is composed of a uniform, thin-film ceramic heating element, a high-density ceramic insulation layer, and an evaporative gas unit to deliver the desired temperature profile. The uniformity of the chamber's temperature profile is maintained with a direct current (DC) power supply that precisely controls both the heating element's temperature and the amount of process gas. AMAT P5000 Chamber includes automated capabilities that allow for precise process monitoring, control, and data logging. The chamber includes a loading and unloading robot, an RF load lock machine, an automated valve tool, and an automated chamber pressure controller to ensure precise control and uniformity of the processing parameters. A template-based computer control asset allows operators to quickly and easily set up and monitor process conditions. The chamber's inert platinum chamber features a rugged chamber door with an air-tight seal that minimizes the risk of contamination during processing. Its stainless steel interior walls and floor provide excellent heat transfer and resist chemical reaction with the process gas or deposition fluid. The chamber is designed with two ports, one for the deposition fluid and one for the exhaust gas, to ensure precise control of the process environment. The chamber's environmental monitoring model ensures that any changes in gas concentrations or pressure are quickly and accurately monitored. This equipment includes multiple sensors and monitors, allowing precise control of the process environment. APPLIED MATERIALS P5000 Chamber also includes a high-efficiency air filtration system to protect the process environment from unwanted contamination. In summary, AMAT / APPLIED MATERIALS P5000 Chamber is a high-performance, single-wafer batch reactor designed for precise deposition in a variety of applications. Its state-of-the-art design offers precise temperature control, automated process monitoring and control, and an environmental monitoring unit to ensure contamination-free processes. This chamber is an excellent choice for achieving high-precision depositions.