Used AMAT / APPLIED MATERIALS Chamber for P5000 #9213363 for sale

AMAT P5000 Chamber is an ultra-high vacuum reactor used for thin-film processing. This cutting-edge chamber is suitable for any type of atmosphere, while variety and flexibility come standard and allow the reactor to handle different substrates and processes. The reactor itself is crafted of stainless steel, aluminum, and oxygen-free copper, which ensures reliable performance and lifetime quality. With UHV chamber walls, the reactor is also capable of processing difficult and reactive materials in an inert atmosphere. APPLIED MATERIALS P5000 Chamber also has specialized components, such as two-zone heating elements and an RF matching network, to ensure optimal performance and the desired thin films. The chamber is operable up to a temperature of 3000 degrees Celsius and has a working pressure range of 1.3x10-10 mbar up to 1x10-6 mbar. It can create tight temperature and pressure profiles throughout the chamber for synergy between the materials and an optimal process. Furthermore, the chamber also features a hybrid indexed-raster scan capability to uniformly target substrate areas and a full-programmable motorized stage to access the entire substrate. AMAT / APPLIED MATERIALS P5000 Chamber is compatible with a variety of sources and introduction systems, including e-gun, Thermion, ion gun, electron beam, and ion source. Its advanced diagnostics, robust pumping system, and flexible configurations make it an ideal choice for any thin-film fabrication application. The chamber is easy to install and maintain, with user-friendly controls and diagnostics that simplify processes and tasks. With its many advanced features, AMAT P5000 Chamber is a reliable and versatile reactor for thin-film processing. It provides an optimal process atmosphere, tight temperature and pressure profiles, and uniform substrate coverage in a variety of processes. As a result, this reactor can help to achieve high-quality thin-film components and consistent products.